Physical Technology (FSI-TFT)

Academic year 1999/2000
Supervisor: prof. RNDr. Tomáš Šikola, CSc.  
Supervising institute: ÚFI all courses guaranted by this institute
Teaching language: Czech
Aims of the course unit:
 
Learning outcomes and competences:
 
Prerequisites:
 
Course contents:
Course gives summary of high technologies for deposition of thin films, coatings, etching, alloying annealing materials especially in vacuum conditions. Course primarily gives explanation of physical principals of these processes.
Teaching methods and criteria:
 
Assesment methods and criteria linked to learning outcomes:
 
Controlled participation in lessons:
 
Type of course unit:
    Lecture  14 × 2 hrs. optionally                  
    Fundamentals seminar  7 × 1 hrs. compulsory                  
    Exercise in computer lab  7 × 1 hrs. compulsory                  
Course curriculum:
    Lecture  
    Fundamentals seminar  
    Exercise in computer lab  
Literature - fundamental:
1. BRODIE, I. - MURAY, J. J.: The Physics of Micro/Nano-Fabrication
2. CHEN, F. F.: Úvod do fyziky plazmatu
3. VÁLYI, L.: Atom and Ion Sources
Literature - recommended:
1. ECKERTOVÁ, L.: Fyzika tenkých vrstev
2. ECKERTOVÁ, L.: Elektronika povrchů
3. RIVIERE, J. C.: Surface Analytical Techniques
The study programmes with the given course:
Programme Study form Branch Spec. Final classification   Course-unit credits     Obligation     Level     Year     Semester  
M2301-5 full-time study -- Cr,Ex 4 Compulsory 1 3 S