Physical Principles of the Semiconductor Technology (FSI-TP0)

Academic year 2022/2023
Supervisor: prof. RNDr. Josef Humlíček, CSc.  
Supervising institute: ÚFI all courses guaranted by this institute
Teaching language: Czech
Aims of the course unit:
The main purpose of the lectures given by experts from industry is to provide the students ability to:
- list and describe individual steps in semiconductors production and device manufacturing
- find how basic physics is applied in semiconductors production manufaturing
- understand how industrial processes are optimized using physics and chemistry models
Learning outcomes and competences:
The course provides knowledge of processes in semiconductors production
Prerequisites:
Solid State Physics, chemistry
Course contents:
Individual steps in semiconductors production and device manufacturing - physics and chemistry models
Teaching methods and criteria:
The course is taught through lectures explaining the basic principles and theory of the discipline.
Assesment methods and criteria linked to learning outcomes:
Colloquium and a brief final report on the problem solution.
Controlled participation in lessons:
 
Type of course unit:
    Lecture  13 × 3 hrs. optionally                  
Course curriculum:
    Lecture The following topics will be covered:
Silicon wafer manufacturing technology overview
Silicon single crystal growth
Defects in silicon
Surface analysis in semiconductor manufacturing
Polishing and cleaning of silicon wafers
Silicon device fabrication overview
Silicon oxidation and impurity diffusion
Chemical vapor phase deposition and plasma assisted layer deposition
Photolithography, silicon oxide etching
Dry etching, metal sputtering
Applied statistics in industry
Literature - fundamental:
1. KERN, Werner. /Handbook of Semiconductor Wafer Cleaning Technology:Science, Technology, and Applications/. New Jersey, U.S.A.: Noyes Publications, 1993. 623 s
2. KITTEL, Charles. /Úvod do fyziky pevných látek : Introduction to solid state physics (Orig.)/. 1. vyd. Praha: Academia, 1985. 598 s
3. WOLF, Stanley a Richard N. TAUBER. /Silicon Processing for the VLSI Era/. Sunset Beach, California, U.S.A.: Lattice Press, 1999. 960 s. Vol. 1: Process Technology
The study programmes with the given course:
Programme Study form Branch Spec. Final classification   Course-unit credits     Obligation     Level     Year     Semester  
N-FIN-P full-time study --- no specialisation -- Col 2 Elective 2 1 W
N-FIN-P full-time study --- no specialisation -- Col 2 Elective 2 2 W
B-FIN-P full-time study --- no specialisation -- Col 2 Elective 1 3 W